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1

Real-time Virtual Metrology and Control of Plasma Electron Density in an Industrial Plasma Etch Chamber

Lynn, Shane A., Macgearailt, Niall, Ringwood, John. V.

Journal:

IFAC Proceedings Volumes

Year:

2011

Language:

english

File:

PDF, 607 KB

english, 2011

2

Real-time virtual metrology and control for plasma etch

Shane A. Lynn, Niall MacGearailt, John V. Ringwood

Journal:

Journal of Process Control

Year:

2012

Language:

english

File:

PDF, 1.05 MB

english, 2012

3

Improved fluid simulations of radio-frequency plasmas using energy dependent ion mobilities

Greb, Arthur, Niemi, Kari, O'Connell, Deborah, Ennis, Gerard J., MacGearailt, Niall, Gans, Timo

Journal:

Physics of Plasmas

Year:

2013

Language:

english

File:

PDF, 1.30 MB

english, 2013

4

[IEEE 2010 IEEE International Conference on Industrial Technology - Vi a del Mar , Chile (2010.03.14-2010.03.17)] 2010 IEEE International Conference on Industrial Technology - Weighted windowed PLS models for virtual metrology of an industrial plasma etch process

Lynn, Shane, Ringwood, John V., MacGearailt, Niall

Year:

2010

Language:

english

File:

PDF, 592 KB

english, 2010

5

[IEEE 2012 IEEE International Conference on Control Applications (CCA) - Dubrovnik, Croatia (2012.10.3-2012.10.5)] 2012 IEEE International Conference on Control Applications - Real-time virtual metrology and control of etch rate in an industrial plasma chamber

Lynn, Shane A., MacGearailt, Niall, Ringwood, John V.

Year:

2012

Language:

english

File:

PDF, 811 KB

english, 2012

6

[IEEE 2008 11th International Conference on Computer and Information Technology (ICCIT) - Khulna, Bangladesh (2008.12.24-2008.12.27)] 2008 11th International Conference on Computer and Information Technology - Selecting signature optical emission spectroscopy variables using sparse principal component analysis

Ma, Beibei, McLoone, Sean, Ringwood, John, Macgearailt, Niall

Year:

2008

Language:

english

File:

PDF, 3.15 MB

english, 2008

7

Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher

Milosavljević, Vladimir, MacGearailt, Niall, Cullen, P. J., Daniels, Stephen, Turner, Miles M.

Journal:

Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 1.07 MB

english, 2013

8

Prediction of Vacuum Pump Degradation in Semiconductor Processing

Butler, Shane W., Ringwood, John V., MacGearailt, Niall

Journal:

IFAC Proceedings Volumes

Year:

2009

Language:

english

File:

PDF, 550 KB

english, 2009